Predictika · Lithography scanner orders
An AI sales agent prepares a quote for TWINSCAN DUV and EUV lithography scanners, in euros. Before it goes out, the agent sends it to Predictika, which checks it against a declarative model of the configuration and commercial rules, compares the total the quote states with the computed one, and returns every finding together with the line-item quote. This is an illustrative model built from public product information with estimated prices; it is not ASML's internal rule set.
This validator models one slice of semiconductor equipment sales: an order for lithography scanners with its options, installation and qualification, and a service agreement. It handles any combination of these scanner models, nodes, regions and service terms, not only the scenarios shown on this page. It does not cover metrology or other product lines, real prices, financing, freight or tax.
9 scenarios in 4 groups · each group runs from the agent’s first attempt to the outcome · click one to switch
Illustrative agent statement. The validator receives the structured request below.
Proposing agent: AI sales agent (scripted)
Before sending, the agent must call Recorded run
What this means
Our assessment of what a typical rules-based CPQ (product rules, price rules and validation rules, as in Salesforce CPQ) does with the same cases. It is a judgment about effort and reliability, not a claim that nothing can be built.
| What the validator caught | Typical rules-based CPQ | Predictika |
|---|---|---|
| Scanner count from the wafer plan | Only with workarounds The count depends on wafer starts, layers and an effective throughput that changes with multi-patterning and the productivity package, so a rules-based tool needs a table for each combination. | The count is computed once from the plan and the effective throughput, and the finding states what is needed against what is quoted. |
| Node reach with multi-patterning | Only with care Whether a scanner can print a feature depends on its type and on the multi-patterning choice, and the same choice halves the throughput. | Resolution, throughput and scanner count are derived from the same choice, so the effects stay consistent. |
| Export control by region and class | Only with workarounds The outcome is a block for some pairs and an approval for others, which a rules-based tool handles as one long list of pair rules. | Region and export class are attributes of the quote and the scanner, and the validator returns a block or an approval with the reason. |
| Delivery date against lead time | Only with care A date can be fine, need a production slot swap, or be impossible, and each outcome routes differently. | The three outcomes come from one comparison, and the approval is listed as a finding rather than a failed check. |
| Discount authority by order size | Only with care The allowed discount and the approver both depend on the number of scanners. | The tier is derived from the quantity, and a discount between the account manager limit and the tier maximum is an approval. |
| Total the agent states | Only with workarounds A validation rule can compare a stated figure with a calculated one only if the stated figure is a field on the quote, which it rarely is. | The stated total travels with the quote and is compared with the computed total on every call; a mismatch is its own block. |
Every rule is checked on every call, in any order the choices arrive; one problem never hides another. Blocking findings stop the quote; approval findings need a person to sign off; everything else is computed.
| 1 | The critical feature the layer needs must be within the scanner's resolution; multi-patterning extends ArF immersion scanners to a finer feature. |
| 2 | Multi-patterning is quoted on ArF immersion scanners only. |
| 3 | Effective throughput is the rated wafers per hour, plus the productivity enhancement package where it is offered, divided by the number of exposures per layer. |
| 4 | The scanner count must cover the wafer plan: wafer starts per month times critical layers, divided by 576 productive hours and the effective throughput, rounded up. |
| 5 | Overlay, with the advanced overlay option where chosen, must meet the process requirement. |
| 6 | The productivity enhancement package is offered on some models only. |
| 7 | Export control by region and export class: EUV to China is blocked; advanced immersion to China and EUV to other regions need an export license review, which is an approval. |
| 8 | Facility power must cover the number of tools times the power of each tool. |
| 9 | EUV systems must be sold with a Full or Full Uptime service agreement. |
| 10 | The service term must be 3 to 10 years. |
| 11 | Lead time: a delivery date more than 3 months shorter than the lead time is blocked, and one up to 3 months shorter needs a production slot swap approval. |
| 12 | Discount authority by order size: an account manager may give 2 percent, and the maximum is 2, 5 or 8 percent for orders of 1-2, 3-9 or 10 or more scanners; anything between needs approval. |
| 13 | The price is built from the catalog: scanners, options, discount, installation and qualification (3 percent of list for DUV, 5 percent for EUV) and service (a percent of list per year by level, plus an EUV uplift). The total the agent states must match the computed total to within one euro; otherwise the quote is blocked. |
The recorded result of the validator for each scenario on this page: the request the AI agent sent, the verdict, and every finding, in the order they appear above.
The agent's request. Please quote three TWINSCAN NXE:3800E EUV scanners for the Halvorsen Wafer Works fab in South Korea, with multi-patterning for a 13 nm critical feature and a 1.2 nm overlay requirement: 40,000 wafer starts per month over 12 critical layers, 4,500 kW of facility power, Basic service for 12 years, a 6 percent discount, and delivery within 12 months. The quote states a total of €1,123,200,000.00. It is ready to send.
Verdict: Blocked.
The agent's request. Please quote four TWINSCAN NXE:3800E EUV scanners for the Halvorsen Wafer Works fab in South Korea, for a 13 nm critical feature and a 1.2 nm overlay requirement: 40,000 wafer starts per month over 12 critical layers, 4,500 kW of facility power, Full service for 10 years, a 4 percent discount, and delivery within 12 months. The quote states a total of €1,688,000,000.00. It is ready to send.
Verdict: Blocked.
The agent's request. Please quote four TWINSCAN NXE:3800E EUV scanners for the Halvorsen Wafer Works fab in South Korea, for a 13 nm critical feature and a 1.2 nm overlay requirement: 40,000 wafer starts per month over 12 critical layers, 6,000 kW of facility power, Full service for 10 years, a 2 percent discount, and delivery within 18 months. The quote states a total of €1,704,000,000.00. It is ready to send.
Verdict: Allowed.
The agent's request. Please quote one TWINSCAN EXE:5200 High-NA EUV scanner for the Kestrel Photonics Research R&D line in the Netherlands: an 8 nm critical feature, 10,000 wafer starts per month over 4 layers, 2,500 kW of facility power, Basic service for 12 years, and delivery within 26 months. The quote states a total of €763,800,000.00. It is ready to send.
Verdict: Blocked.
The agent's request. Please quote one TWINSCAN EXE:5200 High-NA EUV scanner for the Kestrel Photonics Research R&D line in the Netherlands: an 8 nm critical feature, 10,000 wafer starts per month over 4 layers, 2,500 kW of facility power, Full service for 10 years, and delivery within 26 months. The quote states a total of €817,000,000.00. It is ready to send.
Verdict: Allowed.
The agent's request. Please quote three TWINSCAN NXT:2100i ArF immersion scanners for the Brindle Microelectronics fab in Korea: multi-patterning for a 10 nm feature with the advanced overlay option for a 1.2 nm overlay requirement, 30,000 wafer starts per month over 8 layers, 600 kW of facility power, Basic service for five years, and delivery within 16 months. The quote states a total of €299,449,500.00. It is ready to send.
Verdict: Blocked.
The agent's request. Please quote three TWINSCAN NXT:2100i ArF immersion scanners for the Brindle Microelectronics fab in Korea: multi-patterning for a 10 nm feature with the advanced overlay option for a 1.2 nm overlay requirement, 30,000 wafer starts per month over 8 layers, 600 kW of facility power, Basic service for five years, and delivery within 16 months. The quote states a total of €315,210,000.00. It is ready to send.
Verdict: Allowed.
The agent's request. Please quote one TWINSCAN NXT:2100i ArF immersion scanner for the Harrowgate Devices fab in the US: a 38 nm critical feature, a 1.5 nm overlay requirement, 20,000 wafer starts per month over 5 layers, 300 kW of facility power, Basic service for five years, and delivery within 9 months. The quote states a total of €99,750,000.00. It is ready to send.
Verdict: Blocked.
The agent's request. Please quote one TWINSCAN NXT:2100i ArF immersion scanner for the Harrowgate Devices fab in the US: a 38 nm critical feature, a 1.5 nm overlay requirement, 20,000 wafer starts per month over 5 layers, 300 kW of facility power, Basic service for five years, and delivery within 12 months. The quote states a total of €99,750,000.00. It is ready to send.
Verdict: Needs approval.
The text of the narrated walkthrough, step by step.