Predictika · Plasma process tool quotes

An AI sales agent's plasma process tool quote, checked before it goes out

An AI sales agent prepares a quote for a PlasmaPro 100 plasma process tool: a process module, an electrode, an ICP source, a wafer size, a process temperature, gas lines, an endpoint method, a cluster layout, a support tier, a discount and a stated net price. Before it goes out, the agent sends it to Predictika, which checks it against a declarative model of the PlasmaPro 100 and returns a verdict and every reason.

Scope: Oxford Instruments PlasmaPro 100 process modules (Cobra ICP etch, RIE etch, ICP CVD and PECVD) with electrodes, ICP sources, wafer sizes up to 200 mm, gas lines, endpoint, cluster layouts, support, discount and the stated net price. See everything this validator covers

This validator models PlasmaPro 100 quotes, not just the scenarios shown below.

  • Module and electrode — which electrodes fit etch, ICP CVD and PECVD modules, the temperature range of each electrode, and liquid nitrogen cooling for cryogenic processes.
  • Source, wafer and gas — the 65, 180 and 300 mm ICP sources, the wafer each source can serve, up to 12 gas lines, helium backside cooling and the liquid source module.
  • Endpoint, layout and price — optical emission and laser endpoint, the chambers each cluster layout holds, discount thresholds and the stated net price.

Any PlasmaPro 100 quote that touches these rules is in scope — not only the scenarios pictured here. Not covered: other Oxford Instruments plasma tools and other Oxford Instruments businesses. Module types, electrode ranges, source sizes and the 200 mm wafer limit come from public brochures; the other limits, the discount thresholds and all prices are modeled and are not published by Oxford Instruments (see the note at the foot of the page).

The AI sales agentBuilds the tool quote from the conversation and says it is ready.
Predictika validatorChecks every rule at once and returns the verdict, each finding, and the computed figures.

6 scenarios in 3 groups · each group runs from the agent’s first attempt to the outcome · click one to switch

What the agent proposes

The AI sales agent says

Illustrative agent statement. The validator receives the structured request below.

Proposing agent: AI sales agent (scripted)

Before sending, the agent must call Recorded run

Predictika validator


      

        
        
        
      

      
Waiting for the call.

      
    

  

  
  

    
Where rules-based CPQ gets it wrong
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Our assessment of what a typical rules-based CPQ (product rules, price rules and validation rules, as in Salesforce CPQ) does with the same cases. It is a judgment about effort and reliability, not a claim that nothing can be built.

    
What the validator caughtTypical rules-based CPQPredictika
A process temperature that depends on the electrodeOnly with care
Each electrode covers its own temperature range, and cryogenic processes also need liquid nitrogen cooling, so a rule has to read the electrode, the temperature and the cooling together.		The electrode, temperature and cooling are checked together on every call.
Wafer size that depends on the sourceOnly with care
The largest wafer depends on the ICP source size, and a module without an ICP source takes no source size at all.		The module, source and wafer are checked together on every call.
A stated net priceOnly with workarounds
The agent states a price, and a rules engine has to rebuild it from the module, options, support, layout and discount to catch a mismatch.		The price is computed from the quoted configuration and compared with the stated figure on every call.
Every problem returned in one answerOnly with workarounds
Rules tend to fire as the quote is saved or a step is completed, so a rep often fixes one error and meets the next.		All findings come back together, whatever order the choices arrived in.

  

  

    
What this validator catches: findings from its test cases
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Every rule is checked on every call, in any order the choices arrive; one problem never hides another. Blocking findings stop the quote; approval findings need a person to sign off; everything else is computed.

    
1The process runs at -120 C, below what a recirculating chiller reaches (modeled at -20 C); the wide-range electrode needs liquid nitrogen cooling on the quote.
2The process runs at 100 C but the quoted electrode covers -20 C to 80 C.
3The process runs at 800 C but the quoted electrode covers 20 C to 700 C.
4This electrode is not available on the selected process module; etch and ICP CVD modules take the fluid-cooled or wide-temperature-range electrode, PECVD takes the resistively heated electrodes.
5A 150 mm wafer is too large for the quoted 65 mm source (modeled uniformity limit 100 mm).
6PlasmaPro 100 handles wafers up to 200 mm; the quote has 225 mm.
7An ICP source size of 180 mm is quoted on a module that has no ICP source.
8ICP modules need a 65, 180 or 300 mm source; the quote has 0 mm.
9Laser interferometry (etch-to-depth) is quoted on a deposition module.
10The PECVD module is quoted without optical emission spectroscopy, which Oxford Instruments recommends for end-pointing chamber cleans; confirm the customer accepts timed cleans.
11Helium backside cooling with clamping is quoted on a PECVD module, which uses an electrically grounded heated electrode.
12The quote has 4 liquid source precursors; the delivery module takes up to 3.
13A liquid source delivery module is quoted on a module that is not PECVD.
14The quote has 13 gas lines; the gas system takes at most 12.
15The process needs 8 gases but only 6 gas lines are quoted.
16The quote has 5 chambers but the selected layout holds 4 (modeled).
17The quote states a net price of 620 thousand USD; the quoted configuration prices to 605 thousand USD (illustrative prices).
18The discount of 73 thousand USD is between 10 and 20 percent of the gross price of 605 thousand USD; sales management should approve it (modeled threshold).
19The discount of 160 thousand USD is more than 20 percent of the gross price of 605 thousand USD (modeled limit).
20Liquid nitrogen cooling is quoted but only the wide-temperature-range electrode can be cooled that way.

  

  

    
Scenarios and results
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The recorded result of the validator for each scenario on this page: the request the AI agent sent, the verdict, and every finding, in the order they appear above.

    
1. Electrode, source, wafer and gas: A Cobra ICP etch quote with a 400 C heated electrode at 500 C, a 65 mm source for 150 mm wafers and 8 gases on 6 lines

    
The agent's request. Please quote a PlasmaPro 100 Cobra ICP etch module with a 400 C heated electrode, a 65 mm ICP source and 150 mm wafers, running at 500 C, with 6 gas lines for 8 gases, optical emission endpoint and standard support, with helium backside cooling, and a net price of 505,000 dollars. It is ready to send.

    
Verdict: Blocked.

    
    
      
  • Electrode not available on this module. This electrode is not available on the selected process module; etch and ICP CVD modules take the fluid-cooled or wide-temperature-range electrode, PECVD takes the resistively heated electrodes.
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  • Process temperature outside the electrode range. The process runs at 500 C but the quoted electrode covers 20 C to 400 C.
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  • Wafer too large for the ICP source. A 150 mm wafer is too large for the quoted 65 mm source (modeled uniformity limit 100 mm).
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  • Not enough gas lines for the process. The process needs 8 gases but only 6 gas lines are quoted.
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2. Electrode, source, wafer and gas: The agent resubmits after fixing the errors

    
The agent's request. Please quote a PlasmaPro 100 Cobra ICP etch module with a wide-range electrode, a 180 mm ICP source and 150 mm wafers, running at 300 C, with 6 gas lines for 5 gases, optical emission endpoint and standard support, with helium backside cooling, and a net price of 605,000 dollars. It is ready to send.

    
Verdict: Allowed.

    
    
      
  • Price summary. 1 system(s), 1 chamber(s) each at 605 thousand USD per chamber, gross 605 thousand USD, net 605 thousand USD (illustrative prices).
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3. Cryogenic cooling, wafer, gas and discount: A cryogenic etch quote at -120 C with no liquid nitrogen, 225 mm wafers, 13 gas lines and a 26 percent discount

    
The agent's request. Please quote a PlasmaPro 100 Cobra ICP etch module with a wide-range electrode, a 180 mm ICP source and 225 mm wafers, running at -120 C, with 13 gas lines for 10 gases, optical emission endpoint and standard support, with helium backside cooling, with a discount of 160,000 dollars, and a net price of 487,000 dollars. It is ready to send.

    
Verdict: Blocked.

    
    
      
  • Cryogenic process without liquid nitrogen cooling. The process runs at -120 C, below what a recirculating chiller reaches (modeled at -20 C); the wide-range electrode needs liquid nitrogen cooling on the quote.
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  • Wafer larger than the platform. PlasmaPro 100 handles wafers up to 200 mm; the quote has 225 mm.
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  • Too many gas lines. The quote has 13 gas lines; the gas system takes at most 12.
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  • Discount over 20 percent. The discount of 160 thousand USD is more than 20 percent of the gross price of 647 thousand USD (modeled limit).
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4. Cryogenic cooling, wafer, gas and discount: The agent resubmits after fixing the errors

    
The agent's request. Please quote a PlasmaPro 100 Cobra ICP etch module with a wide-range electrode, a 300 mm ICP source and 200 mm wafers, running at -120 C, with 12 gas lines for 10 gases, optical emission endpoint and standard support, with liquid nitrogen cooling, with helium backside cooling, with a discount of 40,000 dollars, and a net price of 666,000 dollars. It is ready to send.

    
Verdict: Allowed.

    
    
      
  • Price summary. 1 system(s), 1 chamber(s) each at 706 thousand USD per chamber, gross 706 thousand USD, net 666 thousand USD (illustrative prices).
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5. PECVD temperature, backside, endpoint and precursors: A PECVD quote at 800 C on a 700 C electrode with helium backside, a laser endpoint and 4 precursors

    
The agent's request. Please quote a PlasmaPro 100 PECVD module with a 700 C heated electrode, no ICP source and 100 mm wafers, running at 800 C, with 6 gas lines for 4 gases, optical emission and laser endpoint and standard support, with helium backside cooling, with 4 liquid source precursors, and a net price of 548,000 dollars. It is ready to send.

    
Verdict: Blocked.

    
    
      
  • Process temperature outside the electrode range. The process runs at 800 C but the quoted electrode covers 20 C to 700 C.
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  • Helium backside cooling on PECVD. Helium backside cooling with clamping is quoted on a PECVD module, which uses an electrically grounded heated electrode.
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  • Too many liquid source precursors. The quote has 4 liquid source precursors; the delivery module takes up to 3.
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  • Laser interferometry on a deposition module. Laser interferometry (etch-to-depth) is quoted on a deposition module.
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6. PECVD temperature, backside, endpoint and precursors: The agent resubmits after fixing the errors

    
The agent's request. Please quote a PlasmaPro 100 PECVD module with a 1200 C heated electrode, no ICP source and 100 mm wafers, running at 800 C, with 6 gas lines for 4 gases, optical emission endpoint and standard support, with 3 liquid source precursors, and a net price of 523,000 dollars. It is ready to send.

    
Verdict: Allowed.

    
    
      
  • Price summary. 1 system(s), 1 chamber(s) each at 523 thousand USD per chamber, gross 523 thousand USD, net 523 thousand USD (illustrative prices).
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Narration transcript
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The text of the narrated walkthrough, step by step.

    
    
      
  1. Welcome to a demo of Predictika's Validator. An AI sales agent prepares a quote for a PlasmaPro 100 plasma process tool: a process module, an electrode, an ICP source, and more. Before it goes out, the agent sends it to Predictika, which checks it against a declarative model of the PlasmaPro 100 and returns a verdict and every reason.
    2. 
      
  2. I will start with the first request by the agent.
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  3. The agent says. Please quote a PlasmaPro 100 Cobra ICP etch module with a 400 C heated electrode, a 65 mm ICP source and 150 mm wafers. It is ready to send. The rest of the request is on screen.
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  4. Before it goes out, the agent calls the validator.
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  5. Blocked, with four findings, all in one answer. This electrode is not available on the selected process module; etch and ICP CVD modules take the fluid-cooled or wide-temperature-range electrode, PECVD takes the resistively heated electrodes. The process runs at 500 C but the quoted electrode covers 20 C to 400 C. A 150 mm wafer is too large for the quoted 65 mm source (modeled uniformity limit 100 mm). The other one is on screen.
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  6. The validator returned four blocking findings in one answer. A check that reads one field at a time would pass most of this; it shows only when the choices in the quote are checked against each other.
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  7. What this shows: for a process temperature that depends on the electrode, a rules-based CPQ is error-prone for this.
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  8. Now the agent resubmits.
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  9. The corrected request. It changes the electrode to wide-range, the ICP source to 180 mm, the process temperature to 300 C, the gases needed to 5 and the stated net price to $605,000.
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  10. It calls the validator again.
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  11. This time the validator clears it.
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  12. All four earlier findings are cleared.
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  13. Four problems caught in one call, fixed in one pass, and a clean $605,000 quote. That is the value of Predictika's validator: catching mistakes before they reach the customer. Now you can try the other scenarios yourself.
    14.